Annealing Furnace

Annealing Furnace is used in semiconductor device fabrication, which consist of heating multiple semiconductor wafers in order to affect their electrical properties. It is designed specifically for changing the physical properties of samples. This is suitable for degassing, drying, glowing, hardening, pyrolysis, tempering, and thermal debinding prior to sintering. It is manufactured under the stern guidance of our team using the finest quality materials in compliance with set industry standards. Apart from this, our respected clients can avail this Magnetic Stirrer from us at industry leading prices.

Specification

Temperature	Up to 1200 degree Celsius
Accuracy	+/-2 degree Celsius
MOC	SS, MS
Inner Muffle size (mm)	225 x 100x100, 250 x 125x125,300 x 125x125,300 x 150x150